The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7235421 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 26, 2007

Filed:

Sep. 16, 2004
Applicant:

Nasreen G. Chopra, Belmont, CA (US);

Inventor:

Nasreen G. Chopra, Belmont, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01I 51/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for developing a manufacturing process includes measuring, in a first testing environment, a primary property of a nano-engineered material at one or more positions to provide one or more measurements. The method also includes determining whether the one or more measurements satisfy a first tolerance criterion and taking a further action based on whether the one or more measurements satisfy the first tolerance criterion. Additionally, a method of measuring thermal properties of a nano-engineered material includes irradiating a nano-engineered material with laser radiation, wherein the laser radiation impinges on a first surface of the nano-engineered material at one ore more locations, capturing at least one image of the nano-engineered material, and analyzing the at least one image to characterize the thermal properties of the nano-engineered material.


Find Patent Forward Citations

Chopra, Nasreen. (2007). System and method for developing production nano-material (U.S. Patent No. 7235421). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7235421

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