The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
May. 19, 2004
Applicant:
Toshiaki Mikoshiba, Suwa, JP;
Inventor:
Toshiaki Mikoshiba, Suwa, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming a film pattern on a substrate includes the steps of: forming banks on the substrate; and making liquid drops of functional liquid land on the substrate to dispose the liquid drops in an area partitioned by the banks, wherein a spacing between the liquid drops are determined so that the liquid drops connect together after they land on the substrate, and a position in which a liquid drop of the liquid drops which lands the closest to an end of the area is spaced from the end of the area by less than a half of the spacing between the liquid drops.