The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Nov. 12, 2003
Applicants:
Paul Gierow, Madison, AL (US);
Greg Laue, Huntsville, AL (US);
William Clayton, Huntsville, AL (US);
David Murphy, Huntsville, AL (US);
Inventors:
Paul Gierow, Madison, AL (US);
Greg Laue, Huntsville, AL (US);
William Clayton, Huntsville, AL (US);
David Murphy, Huntsville, AL (US);
Assignee:
SRS Technologies, Inc., Huntsville, AL (US);
Primary Examiner:
Int. Cl.
CPC ...
B00D 5/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
A target for use in photogrammetric analysis that does not distort the object to be analyzed has been developed. The target is formed by mixing a diffuse material with a solvent and then applying the mixture to the surface of the object to be analyzed. The object is then coated with a reflective material so that the diffuse material forms a reflective target suitable for use in photogrammetric analysis.