The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Dec. 12, 2002
Applicants:
Bruno Bavouzet, Paris, FR;
Mathias Destarac, Paris, FR;
Pascal Herve, West Windsor, NJ (US);
Agnieszka Zofia Wilczewska, Bialystok, PL;
Inventors:
Bruno Bavouzet, Paris, FR;
Mathias Destarac, Paris, FR;
Pascal Herve, West Windsor, NJ (US);
Agnieszka Zofia Wilczewska, Bialystok, PL;
Assignee:
Rhodia Chimie, Aubervilliers, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61Q 5/02 (2006.01); A61Q 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to a cosmetic composition comprising at least one diblock copolymer, as well as to the use of the said diblock copolymer as a modifier of properties of cosmetic compositions, more preferably of compositions for the skin and/or the hair. The diblock copolymer comprises two blocks, block A and block B, wherein block A is a polycationic block and block B is a neutral block.