The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2007
Filed:
Aug. 08, 2002
Andrew C. Perry, Oradell, NJ (US);
Paul S. Gilman, Suffern, NY (US);
Wendell Stuber, Pine Bush, NY (US);
Binu Mathew, Spring Valley, NY (US);
Andrew C. Perry, Oradell, NJ (US);
Paul S. Gilman, Suffern, NY (US);
Wendell Stuber, Pine Bush, NY (US);
Binu Mathew, Spring Valley, NY (US);
Praxair S.T. Technology, Inc., North Haven, CT (US);
Abstract
A precious metal sputter target has a composition selected from the group consisting of platinum, palladium, rhodium, iridium, ruthenium, osmium and single-phase alloys thereof. The sputter target's grain structure is at least about 99 percent recrystallized and has a grain size of less than about 200 μm for improving sputter uniformity. The cryogenic method for producing these sputter targets is also effective for improving sputter performance for silver and gold sputter targets.