The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2007

Filed:

Apr. 21, 2005
Applicants:

Toshinobu Tokita, Tochigi, JP;

Hirohisa Ota, Saitama, JP;

Eigo Kawakami, Tochigi, JP;

Takashi Nakamura, Tokyo, JP;

Kazuyuki Kasumi, Tochgi, JP;

Inventors:

Toshinobu Tokita, Tochigi, JP;

Hirohisa Ota, Saitama, JP;

Eigo Kawakami, Tochigi, JP;

Takashi Nakamura, Tokyo, JP;

Kazuyuki Kasumi, Tochgi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus for exposing a predetermined pattern onto an object via a projection optical system includes a pattern generating unit that includes plural pixels, and generates the predetermined pattern by driving the plural pixels, a measuring unit for measuring at least one of optical performance of the pattern generating unit and a driving state of the plural pixels, and a maintenance unit for maintaining the pattern generating unit based on a measuring result by the measuring unit.


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