The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2007
Filed:
Oct. 01, 2004
Said Ghneim, Richardson, TX (US);
James D. Bernstein, Plano, TX (US);
Lance S. Robertson, Rockwall, TX (US);
Jiejie Xu, Plano, TX (US);
Jeffrey Loewecke, Wylie, TX (US);
Said Ghneim, Richardson, TX (US);
James D. Bernstein, Plano, TX (US);
Lance S. Robertson, Rockwall, TX (US);
Jiejie Xu, Plano, TX (US);
Jeffrey Loewecke, Wylie, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides a method for implanting a dopant in a substrate and a method for manufacturing a semiconductor device. The method for implanting a dopant, among other steps, including tilting a substrate () located on or over an implant platen () about an axis in a first direction with respect to an implant source () and implanting a portion of an implant dose within the substrate () tilted in the first direction. The method further includes tilting the substrate () having already been tilted in the first direction about the axis in a second opposite direction, and implanting at least a portion of the implant dose within the substrate () tilted in the second opposite direction.