The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Aug. 26, 2004
Richard Wendell Foote, Jr., Kennedale, TX (US);
Tom Bold, Roanoke, TX (US);
Rodney Hill, Mansfield, TX (US);
Abhay Ramrao Deshmukh, Arlington, TX (US);
Richard Wendell Foote, Jr., Kennedale, TX (US);
Tom Bold, Roanoke, TX (US);
Rodney Hill, Mansfield, TX (US);
Abhay Ramrao Deshmukh, Arlington, TX (US);
National Semiconductor Corporation, Santa Clara, CA (US);
Abstract
A system and method is disclosed for using plasma to adjust the resistance of a thin film resistor. In one advantageous embodiment of the invention, the resistance of a thin film resistor is increased to cause the thin film resistor to have a desired higher value of resistance. The thin film resistor is formed having an initial value of resistance that is less than the desired value of resistance. Then the thin film resistor is placed in an oxidizing atmosphere. A surface of the thin film resistor is then oxidized to increase the initial value of resistance to the desired value of resistance. The amount of the increase in resistance may be selected by selecting the temperature of the oxidizing atmosphere.