The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Dec. 06, 2002
Shorbu Shioji, Himeji, JP;
Masaru Ishikawa, Himeji, JP;
Shorbu Shioji, Himeji, JP;
Masaru Ishikawa, Himeji, JP;
Nippon Shokubai Co., Ltd., Osaka, JP;
Abstract
The present invention is a method of producing a (meth)acrylic acid based water-soluble polymer having a content of groups in neutralized state of not more than 90 mole percent, where the sum total of acid groups and groups in neutralized state contained in the (meth)acrylic acid based water-soluble polymer is taken as 100 mole percent, which comprises a photopolymerization step of polymerizing a monomer component by irradiating near-ultraviolet rays to a reaction mixture, the said reaction mixture comprising the monomer component, a photopolymerization initiator, a chain transfer agent and a polymerization solvent, the said monomer component containing not less than 50 mole percent of a (meth)acrylic acid monomer, with the whole monomer component subjected to polymerization being taken as 100 mole percent, and a concentration of the said monomer component in the reaction mixture at the time of polymerization being 40 to 97% by mass.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile