The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2007

Filed:

Jan. 07, 2005
Applicants:

Geraud Dubois, Palo Alto, CA (US);

James Hedrick, Pleasanton, CA (US);

Ho-cheol Kim, San Jose, CA (US);

Victor Lee, San Jose, CA (US);

Teddie Magbitang, San Jose, CA (US);

Robert Miller, San Jose, CA (US);

Eva Simonyi, Bronx, NY (US);

Willi Volksen, San Jose, CA (US);

Inventors:

Geraud Dubois, Palo Alto, CA (US);

James Hedrick, Pleasanton, CA (US);

Ho-Cheol Kim, San Jose, CA (US);

Victor Lee, San Jose, CA (US);

Teddie Magbitang, San Jose, CA (US);

Robert Miller, San Jose, CA (US);

Eva Simonyi, Bronx, NY (US);

Willi Volksen, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/469 (2006.01);
U.S. Cl.
CPC ...
Abstract

Oxycarbosilane materials make excellent matrix materials for the formation of porous low-k materials using incorporated pore generators(porogens). The elastic modulus numbers measured for porous samples prepared in this fashion are 3–6 times higher than porous organosilicates prepared using the sacrificial porogen route. The oxycarbosilane materials are used to produce integrated circuits for use in electronics devices.


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