The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2007

Filed:

Dec. 03, 2004
Applicant:

Eiichi Soda, Kanagawa, JP;

Inventor:

Eiichi Soda, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract

A first insulating film, a second insulating film, a third insulating film, an antireflective film, and a resist film are formed in this order on a lower-layer wiring. After dry etching the third insulating film and the second insulating film, using the resist film as a mask, the resist film and the antireflective film are removed by ashing. Thereafter, the first insulating film is dry etched, using the third insulating film as a mask, to form a wiring trench extending to the lower-layer wiring. The dry etching of the third insulating film and the second insulating film is performed using a gas containing fluorine at a pressure of 0.1 Pa to 4 Pa. Ashing is preferably performed using at least one of hydrogen and an inert gas.


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