The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Jul. 29, 2004
Applicants:
Hiroyuki Sugimura, Nagoya, JP;
Nagahiro Saito, Nagoya, JP;
Osamu Takai, Nagoya, JP;
Inventors:
Assignee:
National University Corporation Nagoya University, Nagoya, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An organic monomolecular film is formed on a first substrate, and micro processed using photolithography technique to form an organic monomolecular film pattern. Then, a thin film is selectively grown on the organic monomolecular film pattern, and transcribed onto a second substrate to form a micro pattern made of the thin film on the second substrate.
Quick Actions:
Sugimura, Hiroyuki. (2007). Method for forming a micro pattern, micro pattern, method for fabricating a mold for forming the micro pattern through transcription, and mold for forming the micro pattern through transcription (U.S. Patent No. 7229748). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7229748
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile