The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Apr. 19, 2006
Makoto Aoki, Yokohama, JP;
Satoshi Kojima, Mishima, JP;
Hironori Owaki, Wakamatsu, JP;
Kazuto Hosoi, Mishima, JP;
Jun Ohira, Sunto-gun, JP;
Makoto Aoki, Yokohama, JP;
Satoshi Kojima, Mishima, JP;
Hironori Owaki, Wakamatsu, JP;
Kazuto Hosoi, Mishima, JP;
Jun Ohira, Sunto-gun, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
To provide a high-image-quality electrophotographic photosensitive member having a high sensitivity for a wavelength close to 380 to 500 nm, remarkable image resolution property in which absorption of the wavelength is hardly recognized, working-environment characteristic and high safety and superior in abrasion resistance and fabrication easiness and reducing optical memories and an electrophotographic apparatus using the high-image-quality electrophotographic photosensitive member. In the case of an electrophotographic photosensitive member having a substrate, photoconductive layer formed on the substrate and surface layer formed on the photoconductive layer and using silicon and nitrogen atoms as base material and containing an amorphous material containing at least oxygen atoms, the surface layer contains nitrogen atoms as an average concentration shown by the following expression (1) and contains oxygen atoms by the maximum value Omax of the number of oxygen atoms in the thickness direction:0.3≦N/(Si+N)≦0.7.  (1)