The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Jan. 28, 2004
Lars W. Liebmann, Poughquag, NY (US);
Zachary Baum, Gardiner, NY (US);
Lars W. Liebmann, Poughquag, NY (US);
Zachary Baum, Gardiner, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of designing an alternating phase shifting mask for projecting an image of an integrated circuit design having a plurality of essentially parallel segments of critical width comprises creating essentially parallel alternating phase shifting regions aligned with the critical width segments and extending beyond ends of at least some of the critical width segments, enclosing the integrated circuit layout and the alternating phase shifting regions within a boundary, extending the alternating phase shifting regions to an edge of the boundary, and thereafter creating an alternating phase shifting mask based on the alternating phase shifting regions.