The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2007

Filed:

May. 05, 2006
Applicants:

Seung Soo Hong, Daejeon, KR;

Yong Hyeon Shin, Daejeon, KR;

Kwang Hwa Chung, Daejeon, KR;

Inventors:

Seung Soo Hong, Daejeon, KR;

Yong Hyeon Shin, Daejeon, KR;

Kwang Hwa Chung, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a pressure measuring system for a vacuum chamber, in particular, a pressure measuring system for a vacuum chamber using ultrasonic wave. In this regard, there is provided a pressure measuring system for a vacuum chamber using ultrasonic wave, comprising a vacuum chamberformed with desired vacuum at the inside thereof; ultrasonic wave-emitting means mounted close to an outer peripheral surface of the vacuum chamberfor emitting an ultrasonic waveto the inside of the vacuum chamber; ultrasonic wave-receiving means for receiving a reflection wavereflected after the striking of the ultrasonic waveemitted from the ultrasonic wave-emitting means to the vacuum chamber; reflection wave-detecting means for detecting the reflection wavefrom the ultrasonic wave-receiving means; and amplitude-analyzing means for analyzing the amplitude of the reflection wavedetected by the reflection wave-detecting means.


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