The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2007
Filed:
Mar. 24, 2004
Applicant:
Baokang BI, Okemos, MI (US);
Inventor:
Baokang Bi, Okemos, MI (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern generating system for generating two-dimensional images on a surface includes a light source and one or more Zone Plate Modulator (ZPM) arrays. The ZPM arrays comprise diffractive zone plate modulating elements that are capable of either diffracting or reflecting an incident light according to the image data. In a high-resolution pattern generating system, ZPM arrays are used as spot array generators. A complete high-resolution image is formed by scanning individual light spots in the spot array using a subfield scanning means.