The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7227617 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 05, 2007

Filed:

Jul. 28, 2005
Applicant:

Hiromichi Hara, Utsunomiya, JP;

Inventor:

Hiromichi Hara, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03B 27/58 (2006.01); G03B 27/32 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus that includes an exposure system for exposing a substrate to an energy pattern, a vacuum chamber having an outside wall including first and second units which can be separated from each other, and a first anti-vibration mount being supported by the first unit, and for supporting a first constituent element of the exposure system. The first anti-vibration mount is disposed outside the vacuum chamber. The apparatus further includes a second anti-vibration mount, being supported by the second unit, for supporting a second constituent element of the exposure system.


Find Patent Forward Citations

Hara, Hiromichi. (2007). Exposure apparatus and device manufacturing method (U.S. Patent No. 7227617). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7227617

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…