The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2007
Filed:
Mar. 18, 2004
Ronald E. Laird, Dexter, MI (US);
George Neuman, Ann Arbor, MI (US);
Philip J. Lingle, Temperance, MI (US);
Jean-marc Lemmer, Luxembourg, LU;
Keith H. Schillinger, Farmington, NY (US);
Ronald E. Laird, Dexter, MI (US);
George Neuman, Ann Arbor, MI (US);
Philip J. Lingle, Temperance, MI (US);
Jean-Marc Lemmer, Luxembourg, LU;
Keith H. Schillinger, Farmington, NY (US);
Guardian Industries Corp., Auburn Hills, MI (US);
Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A. (C.R.V.C.), Grand Duche de Luxembourg, unknown;
Abstract
A sputter coated article is provided with improved mechanical durability (e.g., pre-HT scratch resistance) and/or thermal stability by sputtering at least one Ag inclusive layer in an atmosphere including at least Ogas. For instance, in certain example embodiments an Ag inclusive target may be sputtered in an atmosphere including a combination of Ar and Ogas. In certain embodiments, this enables the resulting AgOinfrared (IR) reflecting layer to better adhere to adjacent contact layer(s).