The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2007
Filed:
Jun. 02, 2005
Kenji Matsumoto, Kanagawa, JP;
Toshiro Hayakawa, Kanagawa, JP;
Yoshinori Morimoto, Kanagawa, JP;
Kiichi Kato, Kanagawa, JP;
Kenji Matsumoto, Kanagawa, JP;
Toshiro Hayakawa, Kanagawa, JP;
Yoshinori Morimoto, Kanagawa, JP;
Kiichi Kato, Kanagawa, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
When a ratio R between a total angle φ of a widening angle in a median intensity of light of a light source (a GaN based semiconductor laser) and a total angle 2/φ of a widening angle of light defining a numerical aperture NA of a collimator optical system (collimator lens) is defined as R=(sinNA)×2/φ, the numerical aperture of the collimator optical system (collimator lens) is set so that 2.0≧R≧0.58. Thus, an image exposure device is provided that can suppress stray light of a light source that emits a large amount of stray light.