The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2007
Filed:
Feb. 10, 2005
Thorsten Feiweier, Poxdorf, DE;
Berthold Kiefer, Erlangen, DE;
Wolfgang Renz, Erlangen, DE;
Lothar Schön, Neunkirchen, DE;
Thorsten Feiweier, Poxdorf, DE;
Berthold Kiefer, Erlangen, DE;
Wolfgang Renz, Erlangen, DE;
Lothar Schön, Neunkirchen, DE;
Siemens Aktiengesellschaft, Munich, DE;
Abstract
For generating of magnetic resonance exposures of an examination subject, a dielectric element with high dielectric constant is positioned on the examination subject to locally influence the Bfield distribution, the dielectric element being formed primarily of material whose magnetic resonance line(s) is/are shifted by at least a specific degree relative to the magnetic resonance line of water protons for a given magnetic field. In a measurement for generation of a magnetic resonance exposure a measurement sequence is used, such in the acquisition of the raw image data the dielectric material of the dielectric element supplies no signal contributions for the image generation and/or the signals caused by the dielectric material of the dielectric element can be separated from the signals caused by the examination subject.