The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7223682 B1

PDF
Full Text
Expired
Date of Patent:
May. 29, 2007

Filed:

Dec. 13, 2004
Applicant:

Shinobu Isobe, Tateyama, JP;

Inventor:

Shinobu Isobe, Tateyama, JP;

Assignee:

UMC Japan, Tateyama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making a semiconductor device by forming bumps on pads of a test piece. The method includes a fastening process of pouring a bump material including a liquid and a plurality of individual pump materials toward a target face of a mask substrate, the mask substrate having a plurality of holding holes, and making bump materials to become fastened to the holding holes; a removing process of removing the individual bump materials remaining on the target face from the target face; and a compression process of compressing the pads of the test piece from the side of the target face of the mask substrate toward the mask substrate so as to bond the individual bump materials onto the pads. By this method, micro bump materials can be accurately attached onto pads on a silicon wafer, or the like, and the size of the mask substrate can be easily increased.


Find Patent Forward Citations

Isobe, Shinobu. (2007). Method of making a semiconductor device using bump material including a liquid (U.S. Patent No. 7223682). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7223682

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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