The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2007
Filed:
Oct. 21, 2004
Applicant:
Matthias Lipinski, Poughkeepsie, NY (US);
Inventor:
Matthias Lipinski, Poughkeepsie, NY (US);
Assignee:
Infineon Technologies AG, Munich, DE;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/40 (2006.01); B05D 5/00 (2006.01); C23C 28/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for generating a hard mask for the patterning of a first layer includes applying a second layer, which includes carbon, to the first layer that is to be patterned. A third layer, which includes silicon and carbon, is spun onto the second layer and an organic antireflection coating layer that is to be used with an overlying photoresist layer patternable using 193 nm technology, is appllied to the spun-on third layer.