The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2007
Filed:
Dec. 06, 2000
Kenichiro Sato, Shizuoka, JP;
Toshiaki Aoai, Shizuoka, JP;
Kenichiro Sato, Shizuoka, JP;
Toshiaki Aoai, Shizuoka, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
A positive type photoresist composition suitable for light in the wavelength region of 170 nm to 220 nm, high in sensitivity, excellent in adhesion and giving a good resist pattern profile, which comprises a resin having an ester group represented by the following general formula [I] in its molecule and a compound generating an acid by irradiation of an active light ray or radiation: wherein Rrepresents a hydrogen atom, an alkyl group or a cycloalkyl group; and Rand R, which may be the same or different, each represents a hydrogen atom, an alkyl group, a cycloalkyl group or -A-R, and Rand Rmay combine together to form a ring, wherein Rrepresents a hydrogen atom, an alkyl group or a cycloalkyl group, Rand Ror Rmay combine together to form a ring, and A represents an oxygen atom or a sulfur atom.