The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2007

Filed:

Feb. 22, 2005
Applicants:

Raleigh L. Cox, Baton Rouge, LA (US);

Christopher E. Cox, Denham Springs, LA (US);

Brenda Guy, Baton Rouge, LA (US);

Michael D. Catanzaro, Baton Rouge, LA (US);

Murphy M. Arcemont, Iii, Gonzales, LA (US);

Travis L. Lejeune, Baton Rouge, LA (US);

Inventors:

Raleigh L. Cox, Baton Rouge, LA (US);

Christopher E. Cox, Denham Springs, LA (US);

Brenda Guy, Baton Rouge, LA (US);

Michael D. Catanzaro, Baton Rouge, LA (US);

Murphy M. Arcemont, III, Gonzales, LA (US);

Travis L. LeJeune, Baton Rouge, LA (US);

Assignee:

Pentair Pump Group, Inc., Golden Vallye, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 3/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A reactor chamber for placement in a wastewater treatment system, where the reactor chamber has a chamber formed from a sidewall which forms an interior of the chamber. The sidewall has a top portion and a bottom portion and fixed channel growth media positioned in the interior of the chamber. The fixed channel growth media is positioned below the top of the sidewall, so that when positioned in a treatment system, most of the growth media is located below the water level in the treatment system. The top of the sidewall near the water level (when positioned in a treatment system) is substantially impermeable to wastewater. The reactor includes an air distribution manifold system having a series of air release sites positioned below the fixed channel growth media and adapted to release air which disperses upwardly through the fixed channel growth media. Influent is discharged into the treatment tank near the air discharge sites.


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