The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2007

Filed:

May. 10, 2005
Applicants:

Po Huang Lin, Hsinchu, TW;

Yi Jen Su, Hsinchu, TW;

Miin Chih Shih, Hsinchu, TW;

Inventors:

Po Huang Lin, Hsinchu, TW;

Yi Jen Su, Hsinchu, TW;

Miin Chih Shih, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for manipulating an integrated circuit layout allowing for reuse and migration. The method comprises steps of identifying objects in a geometric layout to generate a first symbolic layout, nesting a plurality of objects in the first symbolic layout to generate a first virtual device, and associating the first virtual device to generate a second symbolic layout. The method further comprises a step of modifying parameters and constraints of the first virtual device to generate a third virtual device, and a step of optimizing a second symbolic layout including the first virtual devices to generate a third symbolic layout based on the third virtual device. Consequently, the second symbolic layout can be reused. Further, the method comprises a step of updating parameters and constraints of the first virtual device based on new process rules to generate a fourth virtual device so that the second symbolic layout can be used to generate a third symbolic layout for migration.


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