The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2007
Filed:
Apr. 18, 2006
Christophe Moser, Monrovia, CA (US);
Sebastien Blais-ouellette, Laval, CA;
Keith Matthews, Pasadena, CA (US);
Christophe Moser, Monrovia, CA (US);
Sebastien Blais-Ouellette, Laval, CA;
Keith Matthews, Pasadena, CA (US);
California Institute of Technology, Pasadena, CA (US);
Abstract
Narrow-line holographic filters that can include a plurality of lines and that can be structured to provide a large aperture device. Materials that can be used to construct filters include glasses, photorefractive crystals such as lithium niobate and photorefractive thick polymers. The filters are fabricated by assembling a plurality of elements having the same one or more narrow line holographic filter patterns written thereon, in mutual orientation such that each element has a surface defined by a length and a width adjacent a corresponding surface of a neighboring element, and has a surface defined by a thickness and one of a length and a width accessible to impinging illumination. Filters exhibiting a plurality of characteristic narrow lines, and having arbitrarily large apertures can be fabricated. Methods of fabricating and using the filters are described.