The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2007
Filed:
Feb. 28, 2006
Yoshihiro Shiode, Utsunomiya, JP;
Seiya Miura, Utsunomiya, JP;
Yoshihiro Shiode, Utsunomiya, JP;
Seiya Miura, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure method for an exposure apparatus that exposes a mask pattern onto a plate using a projection optical system includes the steps of obtaining information about flatness of a first mask, condition of an image plane when projecting a pattern of the first mask by using the projection optical system, information about a driving amount of a driving system, which can change an imaging condition on the plate based on the condition of the image plane, and information about flatness of a second mask, changing information about the driving amount by using information about flatness of the first and second masks, and driving the driving system based on changed information about the driving amount of the driving system to project a pattern of the second mask onto the plate using the projection optical system.