The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2007
Filed:
Aug. 10, 2005
Kazuyuki Miyashita, Suwa, JP;
Kazuyuki Miyashita, Suwa, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A method for manufacturing a semiconductor device includes: forming a semiconductor film on a substrate; performing dehydrogenation for removing hydrogen from the semiconductor film; performing inactivation by terminating a dangling bond of the semiconductor film with a supply of a molecule containing an impurity element to the semiconductor film at a concentration in accordance with a doping quantity; and crystallizing the semiconductor film while doping the impurity element contained in the molecule bonded to the dangling bond to the semiconductor film with a supply of energy to the inactivated semiconductor film, wherein the first to fourth steps are performed in an environment isolated from an atmosphere.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile