The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2007
Filed:
Apr. 16, 2004
Applicants:
Chang Wei, Niskayama, NY (US);
Barry Lee-mean Yang, Dublin, OH (US);
Yiqun Pan, Brookfield, WI (US);
Inventors:
Chang Wei, Niskayama, NY (US);
Barry Lee-Mean Yang, Dublin, OH (US);
Yiqun Pan, Brookfield, WI (US);
Assignee:
Lockheed Martin Corporation, Bethesda, MD (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 13/04 (2006.01); G02B 7/192 (2006.01);
U.S. Cl.
CPC ...
Abstract
Device of layered structures for optical reflectors and method for making the device. A device for providing environmental stability and mechanical integrity in space includes a substrate and a first silicon oxynitride layer on the substrate. The first silicon oxynitride layer has a tensile stress. Additionally, the device includes a second silicon oxynitride layer on the first silicon oxynitride layer. The second silicon oxynitride layer has a compressive stress.