The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2007
Filed:
Aug. 26, 2005
Applicants:
Takashi Murakami, Tokyo, JP;
Kazuhiro Fukuda, Tokyo, JP;
Inventors:
Takashi Murakami, Tokyo, JP;
Kazuhiro Fukuda, Tokyo, JP;
Assignee:
Konica Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a layer or layers are disclosed which comprises the steps of transporting a substrate having a first surface and a second surface on the side opposite the first surface to a gap formed between a first electrode and a second electrode opposing each other, the second surface having a coefficient of kinetic friction of not more than 0.9; and subjecting the first surface of the substrate to plasma discharge treatment to form the layer at atmospheric pressure or at approximately atmospheric pressure while supplying a reactive gas to the gap.