The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2007
Filed:
Feb. 25, 2004
David John Bishop, Summit, NJ (US);
John Vanatta Gates, New Providence, NJ (US);
Marc Scott Hodes, New Providence, NJ (US);
Avinoam Kornblit, Highland Park, NJ (US);
Stanley Pau, Hoboken, NJ (US);
Brijesh Vyas, Warren, NJ (US);
David John Bishop, Summit, NJ (US);
John VanAtta Gates, New Providence, NJ (US);
Marc Scott Hodes, New Providence, NJ (US);
Avinoam Kornblit, Highland Park, NJ (US);
Stanley Pau, Hoboken, NJ (US);
Brijesh Vyas, Warren, NJ (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
Apparatus and method for increasing the concentration of a chemical substance in a fluid comprise a micro-fluidic elongated channel formed in a substrate, with the channel being in fluid-flow communication with an ambient region along its elongated dimension. In general, the fluid includes first and second chemical substances having different vapor pressures. The apparatus includes an evaporation controller for increasing the evaporation rate of the fluid from the channel into the ambient region, thereby increasing the concentration of the higher vapor pressure (HVP) substance in the portion of the fluid remaining in the channel and increasing the concentration of the lower vapor pressure (LVP) substance in the portion of the fluid evaporated into the ambient region.