The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2007

Filed:

May. 13, 2003
Applicants:

David R. Shafer, Fairfield, CT (US);

Russell Hudyma, San Ramon, CA (US);

Wilhelm Ulrich, Aalen, DE;

Inventors:

David R. Shafer, Fairfield, CT (US);

Russell Hudyma, San Ramon, CA (US);

Wilhelm Ulrich, Aalen, DE;

Assignee:

Carl-Zeiss Stiftung, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 17/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than the first optical group having a number of lenses. The second optical group has a negative overall magnifying power for providing image reduction. The first optical group provides compensative aberrative correction for the second optical group. The objective forms an image with a numerical aperture of at least substantially 0.65, and preferably greater than 0.70 or still more preferably greater than 0.75.


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