The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2007
Filed:
May. 14, 2003
Norman Vandenberg, Linden, MI (US);
Norman VandenBerg, Linden, MI (US);
Veridian Systems, Ann Arbor, MI (US);
Abstract
A synthetic aperture radar system uses RF bandwidth and Doppler beam sharpening principles to develop fine altitude and along-track resolutions. To achieve accurate cross-track position measurements the system and method exploit a combination of modes based on a novel antenna pattern combination. The unique arrangement of the antenna patterns allows the radar to process terrain elevation measurements in three independent modes, namely, time-delay response (TDR), amplitude monopulse (AM) and phase monopulse (PM). The additional modes address the interfering scatter problem and the calibration issues required for practical and cost effective operation. The approach also maximizes the number of terrain measurements made per look, thereby reducing the impact of errors and noise through averaging and 'voting' (i.e., the comparison of measurements and discarding of 'outliers').