The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2007

Filed:

Oct. 24, 2002
Applicants:

Jeong-su Choi, Suncheon, KR;

Sung-hee Kim, Gwangju, KR;

Hyoung-min Bahn, Yeosu, KR;

Keun-hoon Yoo, Daejeon, KR;

Inventors:

Jeong-Su Choi, Suncheon, KR;

Sung-Hee Kim, Gwangju, KR;

Hyoung-Min Bahn, Yeosu, KR;

Keun-Hoon Yoo, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 51/08 (2006.01); C08L 55/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency and preparation thereof, and particularly to acrylonitrile-butadiene-styrene copolymer transparent resin having superior chemical resistance and transparency by graft-copolymerzing on a) conjugated diene rubber latex, b) methacrylate alkylester or acrylate alkylester compound, c) aromatic vinyl compound and d) vinyl cyanide compound, and preparation thereof. In addition, according to the present invention, chemical resistance and ESCR can be further improved by further adding e) polyester-amide copolymer to the acrylonitrile-butadiene-styrene copolymer transparent resin.


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