The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2007

Filed:

Sep. 05, 2002
Applicants:

Rusty L. Blanski, Lancaster, CA (US);

Shawn H. Phillips, Lancaster, CA (US);

Stephen L. Rodgers, Madison, AL (US);

Joseph D. Lichtenhan, San Juan Capistrano, CA (US);

Joseph J. Schwab, Huntington Beach, CA (US);

Inventors:

Rusty L. Blanski, Lancaster, CA (US);

Shawn H. Phillips, Lancaster, CA (US);

Stephen L. Rodgers, Madison, AL (US);

Joseph D. Lichtenhan, San Juan Capistrano, CA (US);

Joseph J. Schwab, Huntington Beach, CA (US);

Assignee:

Other;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C10M 139/00 (2006.01); C10M 171/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

Nanoscale chemicals based on polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) are taught as lubricants, mold release agents, and as additives to control the viscosity, lubrication, wear, and thermal properties of conventional lubricous materials. The precisely defined nanoscopic dimensions of POSS materials enable viscosity, miscibility, and thermal properties to be (increased) or reduced (decreased) as desired. A key feature to the successful tailoring of properties is the inherent thermal and chemical stability of the POSS/POS nanostructure and the ability to control its topology and chemical potential to match that of surfaces and other materials.


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