The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2007
Filed:
Apr. 16, 2003
Han Cao, Blawenburg, NJ (US);
Jonas O. Tegenfeldt, Lund, SE;
Stephen Chou, Princeton, NJ (US);
Robert H. Austin, Princeton, NJ (US);
Han Cao, Blawenburg, NJ (US);
Jonas O. Tegenfeldt, Lund, SE;
Stephen Chou, Princeton, NJ (US);
Robert H. Austin, Princeton, NJ (US);
Princeton University, Princeton, NJ (US);
Abstract
The present invention relates to a device for interfacing nanofluidic and microfluidic components suitable for use in performing high throughput macromolecular analysis. Diffraction gradient lithography (DGL) is used to form a gradient interface between a microfluidic area and a nanofluidic area. The gradient interface area reduces the local entropic barrier to nanochannels formed in the nanofluidic area. In one embodiment, the gradient interface area is formed of lateral spatial gradient structures for narrowing the cross section of a value from the micron to the nanometer length scale. In another embodiment, the gradient interface area is formed of a vertical sloped gradient structure. Additionally, the gradient structure can provide both a lateral and vertical gradient.