The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7217503 B1

PDF
Full Text
Expired
Date of Patent:
May. 15, 2007

Filed:

Apr. 24, 2002
Applicants:

Kenji Saitoh, Tochigi, JP;

Akiyoshi Suzuki, Tokyo, JP;

Kenji Yamazoe, Tochigi, JP;

Inventors:

Kenji Saitoh, Tochigi, JP;

Akiyoshi Suzuki, Tokyo, JP;

Kenji Yamazoe, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.


Find Patent Forward Citations

Loading…