The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2007
Filed:
Nov. 05, 2003
Kazuhiko Sueoka, Ageo, JP;
Yasuji Takada, Ageo, JP;
Kazuhiko Sueoka, Ageo, JP;
Yasuji Takada, Ageo, JP;
Fukoku Co., Ltd., Saitama-ken, JP;
Abstract
There are disclosed a method and a reaction apparatus which can safely and continuously treat/discharge especially a short object to be treated without any direct contact with a gas atmosphere, and which surely/efficiently treats the object with a gas without any uneven treatment. A short object A to be treated is put in a hermetically sealed cylindrical treatment section. In the treatment section, the object is held in a predetermined position by a first operation pieceto be treated with a gas for a predetermined time. Then, the holding by the first operation piece is released to move the object A by a desired distance. Subsequently, the object is held in a predetermined position by a second operation pieceto be treated again with the gas for a predetermined time, and then a treated object Ais discharged. This discharged treated object Ais conveyed to the outside of the apparatus.