The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2007
Filed:
May. 01, 2006
Jovica Savic, Downers Grove, IL (US);
Manes Eliacin, Buffalo Grove, IL (US);
Junhua Liu, Palatine, IL (US);
Aroon V. Tungare, Winfield, IL (US);
Jovica Savic, Downers Grove, IL (US);
Manes Eliacin, Buffalo Grove, IL (US);
Junhua Liu, Palatine, IL (US);
Aroon V. Tungare, Winfield, IL (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A meso-electromechanical system () includes a substrate (), a standoff () disposed on a surface of the substrate, a first electrostatic pattern () disposed on the surface of the substrate, and a glass beam (). The glass beam () has a fixed region () attached to the standoff and has a second electrostatic pattern () on a cantilevered location of the glass beam. The second electrostatic pattern is substantially co-extensive with and parallel to the first electrostatic pattern. The second electrostatic pattern has a relaxed separation () from the first electrostatic pattern when the first and second electrostatic patterns are in a non-energized state. In some embodiments, a mirror is formed by the electrostatic materials that form the second electrostatic pattern. The glass beam may be patterned using sandblasting ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile