The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2007
Filed:
Sep. 10, 2001
Applicant:
Yoshiharu Yamamoto, Shiga 525-0025, JP;
Inventor:
Yoshiharu Yamamoto, Shiga 525-0025, JP;
Assignee:
Other;
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A cleansing apparatus comprising: a tablefor supporting a semiconductor substratehorizontally; a high frequency solution injectorcapable of injecting a solution to the upper surfacesupported by the tablewith the application of vibration at high frequency; a covercapable of tightly enclosing the semiconductor substratesupported by the table; and pressure reducing meansfor reducing the pressure in a space, in which the semiconductor substrateis enclosed with the cover. The semiconductor substrate can be cleansed efficiently at a low cost and kept in clean state after the cleansing until it is dried.