The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2007
Filed:
Sep. 27, 2002
Helmut Paul, Dachau, DE;
Walter Herrmann, Munich, DE;
Helmut Paul, Dachau, DE;
Walter Herrmann, Munich, DE;
MLT Micro Laser Technology GmbH, Kirchheim, DE;
Abstract
An apparatus for substrate treatment by means of laser radiation includes a rotating polygonal mirror by which at least one incident laser beam is reflected and is pivotable across an arrangement of converging lenses which lie next to one another and which are arranged at a spacing from the substrate corresponding precisely or approximately to their focal lengths. The rotating polygonal mirror is divided into at least two regions having a different number of facets and is adjustable such that different regions can be introduced into the beam path of the laser radiation and accordingly different sweep angles or fan angles of the laser beam reflected by the rotating polygonal mirror can be set.