The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2007

Filed:

Dec. 06, 2005
Applicants:

Paul W. Woodford, Laurel, MD (US);

Gerald Davieau, Eldersburg, MD (US);

James L. Lafuse, Columbia, MD (US);

Inventors:

Paul W. Woodford, Laurel, MD (US);

Gerald Davieau, Eldersburg, MD (US);

James L. Lafuse, Columbia, MD (US);

Assignee:

Essex Corp., Columbia, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 13/90 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for mitigating sidelobes and aliases, providing levels of suppression in excess of 20 dB. The methods may include 1) a version of the CLEAN algorithm developed in radio astronomy, modified to work on sub-aperture images; 2) weighting functions based on the phase and amplitude statistics of the sub-aperture image pixels to select points in the CLEAN algorithm; and 3) weighting functions based on the phase and amplitude statistics of the sub-aperture image pixels to mitigate sidelobes and aliases, in conjunction with CLEAN or separately. The methods may be used with all synthetic aperture techniques and are not limited to SAR.


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