The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2007

Filed:

Oct. 02, 2003
Applicants:

Kenneth K. LI, Arcadia, CA (US);

Sheldon Sillyman, Murrieta, CA (US);

Inventors:

Kenneth K. Li, Arcadia, CA (US);

Sheldon Sillyman, Murrieta, CA (US);

Assignee:

Wavien, Inc., Santa Clarita, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 33/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multiple output illumination system includes a first and second reflectors each having an optical axis and a first and second focal points substantially on the optical axis. In one embodiment, one of the focal points of each reflector are proximate to one another, while the other focal point of each reflector is distal from each other. In another embodiment, the first and second reflectors are pairs of reflectors, and the second reflector of each points away from the optical axes of the first and second reflectors. An intermediate reflector may redirect radiation from the second reflectors. A source of electromagnetic radiation substantially proximate to the focal points that are proximate to one another produces rays of radiation that are reflected by the each reflector in different directions, converging substantially at each of the distal focal points. Light pipes placed substantially proximate to the distal focal points may collect the radiation.


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