The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2007

Filed:

Sep. 13, 2004
Applicant:

Randall H. Wilson, Albuquerque, NM (US);

Inventor:

Randall H. Wilson, Albuquerque, NM (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of randomizing elements into a random pattern on a surface so the random pattern of elements substantially entirely consumes a region of the surface includes choosing an overlap distance and creating an initial pattern of elements that substantially entirely consumes a region of the surface, wherein neighboring elements overlap by the overlap distance. The method also includes choosing a maximum displacement distance, and displacing the elements by random displacement distances from their positions in the initial pattern, the random displacement distances being less than the maximum displacement distance. Moreover, a signed difference in displacement between two neighboring elements is not greater than the overlap distance. An apparatus including the elements is also disclosed.


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