The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2007
Filed:
Feb. 19, 2003
Takemi Kawazoe, Tokyo, JP;
Ko Yoshimura, Tokyo, JP;
Tadahito Kanaizuka, Tokyo, JP;
Sumitomo Metal Mining Co., Ltd., Tokyo, JP;
Abstract
A method for manufacturing a semiconductor module incorporated with an optical isolator making use of a Faraday rotator formed of a magnetic garnet film in which a magnetically saturated condition is maintained even without any external magnetic field, in which, at the time the magnetic garnet film is exposed to a temperature of 100° C. or more in a step during manufacture, an external magnetic field is applied in the same direction as the direction of magnetization of this magnetic garnet film. This manufacturing method has an advantage that the high-coercivity film magnetic garnet film is not removed from its magnetically saturated condition even when heating steps are present in the course of manufacture.