The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2007

Filed:

Oct. 27, 2003
Applicants:

Tomohiro Ishikawa, Rochester, NY (US);

James F. Elman, Fairport, NY (US);

Dennis J. Massa, Pittsford, NY (US);

Erica N. Montbach, Pittsford, NY (US);

David M. Teegarden, Pittsford, NY (US);

Inventors:

Tomohiro Ishikawa, Rochester, NY (US);

James F. Elman, Fairport, NY (US);

Dennis J. Massa, Pittsford, NY (US);

Erica N. Montbach, Pittsford, NY (US);

David M. Teegarden, Pittsford, NY (US);

Assignee:

Nitto Denko Corporation, Ibaraki-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 7/02 (2006.01); G02F 1/13 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is an optical multilayer comprising a polymeric substrate having a non-zero out-of plane birefringence and an amorphous polymeric overlayer that comprises an amorphous polymer having a Tg value above 160° C. and having the sign of its out-of-plane birefringence opposite to that of the polymeric substrate so as to provide a total out-of-plane phase retardation of said optical multilayer of between −30 nm and 30 nm for wavelengths of light between 400 and 700 nm.


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