The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2007

Filed:

Jun. 03, 2004
Applicants:

James F. Elman, Fairport, NY (US);

William J. Gamble, Rochester, NY (US);

Daniel F. Hurley, Webster, NY (US);

Inventors:

James F. Elman, Fairport, NY (US);

William J. Gamble, Rochester, NY (US);

Daniel F. Hurley, Webster, NY (US);

Assignee:

Nitto Denko Corporation, Ibaraki-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/3363 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multilayer compensator includes one or more polymeric first layers and one or more polymeric second layers. The first layers comprise a polymer having an out-of-plane (Δn) birefringence not more negative than −0.01 or not more positive than +0.01. The second layers comprise an amorphous polymer having an out-of-plane birefringence more negative than −0.01 or more positive than +0.01. An overall in-plane retardation (R) of the multilayer compensator is greater than 20 nm and the out-of-plane retardation (R) of the multilayer compensator is more negative than −20 nm or more positive than +20 nm. The in-plane retardation (Rin) of the one or more first layers is 30% or less of the overall in-plane retardation (Rin) of the multilayer compensator.


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