The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2007
Filed:
Aug. 04, 2003
Applicants:
Marie-claire Cyrille, San Jose, CA (US);
Kim Y. Lee, Fremont, CA (US);
Jui-lung LI, San Jose, CA (US);
Chun-ming Wang, Fremont, CA (US);
Inventors:
Marie-Claire Cyrille, San Jose, CA (US);
Kim Y. Lee, Fremont, CA (US);
Jui-Lung Li, San Jose, CA (US);
Chun-Ming Wang, Fremont, CA (US);
Assignee:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith are disclosed. Chemical mechanical polishing is combined with liftoff using only a single resist layer to allow the removal of leftover fencing on the side of a lifted resist pattern.
Quick Actions:
Cyrille, Marie-Claire. (2007). Method for providing a liftoff process using a single layer resist and chemical mechanical polishing and sensor formed therewith (U.S. Patent No. 7211195). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7211195
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile