The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2007
Filed:
Dec. 08, 2005
Po-hsiung Huang, Taipei, TW;
Cheng-kun Chu, Tucheng, TW;
Hung-en Chen, Taipei, TW;
Jing-tyr Lin, Taoyuan County, TW;
Jen-hsiung Lee, Banciao, TW;
Po-Hsiung Huang, Taipei, TW;
Cheng-Kun Chu, Tucheng, TW;
Hung-En Chen, Taipei, TW;
Jing-Tyr Lin, Taoyuan County, TW;
Jen-Hsiung Lee, Banciao, TW;
Taiwan Textile Research Institute, Taipei Country, TW;
Champak Enterprise Co., Ltd., Taoyuan County, TW;
Abstract
A face mask structure has an upper mask portion, a middle mask portion, and a lower mask portion, which are formed integrally. The upper mask portion has an upper metal stripe disposed at a proper position thereof. The lower mask portion has a lower metal stripe disposed at a proper position thereof. The upper and lower mask portions are folded in opposite directions. When in use, the upper and lower mask portions are spread out to support the middle mask portion. In this way, the face mask structure becomes fitting in with the shapes of human faces. Furthermore, the middle mask portion has multiple folding portions. When in use, the folding portions are stretched out to increase filtering area. Thereby, the inner space of the face mask structure is increased, the air-invasion rate is reduced, and the filtering efficiency is thus improved.