The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2007

Filed:

Aug. 04, 2005
Applicants:

Takafumi Naka, Aichi-ken, JP;

Takashi Hirata, Nagoya, JP;

Ayako Yoshimura, Nagoya, JP;

Inventors:

Takafumi Naka, Aichi-ken, JP;

Takashi Hirata, Nagoya, JP;

Ayako Yoshimura, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D05B 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sewing machine includes an embroidery stitching data storage storing embroidery stitching data of a plurality of divided patterns with respect to large-size embroidery patterns, a pattern display data storage storing pattern display data for displaying each large-size embroidery pattern in a real image close to an embroidered state, and a display control device reading pattern display data with respect to an appointed large-size embroidery pattern from the pattern display data storage and controls to display an image. The display control device is adapted so that, when each divided pattern constituting the large-size embroidery pattern is subjected to the embroidery stitching, a display is caused to display the pattern display data of the large-size embroidery pattern read from the pattern display data storage and displayed area data indicating the stitching area occupied by each divided pattern in the large-size embroidery pattern in a state being combined with each other.


Find Patent Forward Citations

Loading…